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Get Photomask For Forming A Resist Pattern And ... - Google Books

PATTERN AND MANUFACTURING METHOD THEREOF, AND RESIST-PATTERN FORMING METHOD USING THE PHOTOMASK (76) Inventor: Sep. 27, 2007 (51) (52) Takamitsu FurukaWa, Tokyo (JP) Int. Cl. G03F 9/00 G03F 1/00 (2006.01) (2006.01) US. Cl. ............................................ .. 430/5; 430/22 (57) ABSTRACT Correspondence Address: A method includes; a step of setting square mask cells in VOLENTINE & WHITT PLLC ONE FREEDOM SQUARE, 11951 FREEDOM DRIVE SUITE 1260 by demarcating by orthogonal.

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